Manufacturer of Lasers and Magneto-Optical InstrumentsJapanese

Magneto-Optical Effect Measurement System (For Industrial Purpose)

“For Wafer” Perpendicular Magnetic Layer Evaluation System

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Model: BH-810CPC25WF12
Features
  • Specially Designed for evaluation of Perpendicular Magnetic Layer of 12 Inch Wafer
Specification
Main Function: Kerr Loop Measurement and Mapping Measurement
(Polar Kerr Effect)
Light Source: Diode Laser
Probe Light Spot Size: φ1mm (Typ.)
Generating Magnetic Field: Max. ± 25Oe (2.5T)

“For Wafer” In-Plane Magnetic Layer Evaluation System

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Model: BH-618SK-12
Features
  • Specially Designed for evaluation of In-Plane Magnetic Layer of 12 Inch Wafer
Specification
Main Function Kerr Loop Measurement and Mapping Measurement
(Longitudinal Kerr Effect)
Light Source: Diode Laser
Probe Light Spot Size: φ1mm (Typ.)
Generating Magnetic Field: Max. ± 2kOe (0.2T)

“For Hard Disc” Perpendicular Magnetic Recording Layer
Evaluation System

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Model: BH-810CPC
Features
  • Specially Designed for evaluation of Perpendicular Magnetic Media of
    both 2.5 inch and 3.5 Inch Hard Disk
Specification
Main Function: Kerr Loop Measurement and Mapping Measurement
(Polar Kerr Effect)
Light Source: Diode Laser
Probe Light Spot Size: φ1mm (Typ.)
Generating Magnetic Field: Max. ±25kOe (2.5T)
Test measurement is available.

“For Hard Disc” Soft Under Layer (SUL) Evaluation System

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Model: BH-618HS
Features
  • Specially Designed for evaluation of Soft Under Layer (SUL) of both 2.5 inch
    and 3.5 Inch Hard Disk
Specification
Main Function: Kerr Loop Measurement and Mapping Measurement
(Longitudinal Kerr Effect)
Light Source: Diode Laser
Probe Light Spot Size: φ1mm (Typ.)
Generating Magnetic Field: Max. ±3kOe (0.3T)
Test measurement is available.

Contact Information TEL:+81-3-6379-5539MAIL:info@neoark.co.jp

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