Product  

Laser

Iodine Stabilized Helium Neon Laser
Model: NEO-92SI-NF

Summary

Helium Neon Laser whose frequency is stabilized
to saturated absorption lines of Iodine molecules.

Wavelength 632.9918nm
Frequency
Uncertainty
2.5×10-11
*Compliant to CIPM recommendations in 1992
Laser Power 50±25μW

Application

Specific Secondary Standard for
Length Traceability

Frequency Calibration for Wavelength
Stabilized Lasers

Offset Lock Helium Neon Laser
Model: NEO-OL101K

Summary

Helium Neon Laser whose frequency can be
stabilized to frequency stabilized lasers, such as
Iodine Stabilized Helium Neon laser.

Wavelength 632.8nm
Frequency
Uncertainty
According to stability of Frequency
Stabilization Source
Laser Power 1mW

Application

Cancellation of Frequency Modulation of Frequency Stabilization Source

Calibration of Lasers and Gauge Blocks

Laser Source for Length Measuring Instruments,
Laser Interferometers and others.

Acetylene Stabilized Diode Laser
Model: C2H2LDS-1540

Summary

Diode Laser whose frequency is stabilized to saturated absorption lines of Acetylene Molecules.

Wavelength 1542.3837nm
Frequency
Uncertainty
1×10-11
*Gate Time 1 second
Laser Power 1mW

Application

Specific Secondary Standard for Optical Communication Band Frequency

Frequency Calibration for Wavemeters and Optical Spectrum Analyzers

Other Stabilized Lasers

Mode Balanced Type Frequency Stabilized Laser
Model: MODEL-430

Wavelength Frequency
Stability
Laser Power
632.8nm 1×10-8 0.3mW

Power Stabilized Laser
Model: NEO-MSS Series

Wavelength Power
Stability
Laser Power
632.8nm ±0.5%/h 1mW
or
3mW

Fiber Coupling Type Line Laser Projector
Model: LDF Series

Summary

Line Laser Projector using optical fiber in order to separate its projector and controller for flexible handling for installation and position adjustment.

Feature

Specification

Laser
Color
Line
Length
Laser
Power
Optical Fiber
Length
Red *1 1.9m *2 1~4mW 3m *3
*1 Other color types are available.
*2 Line Length @ Distance 2m from Laser Projector
*3 Other fiber lengths are available.

1 set of product power supply supports simultaneous projection of total 3 sets of projectors.

Laser Class 2 product (JIS C 6802:2011)

Single Line Laser Projector
Model: DM Series

Lineup

Model Laser
Color
Laser Power Laser
Class *
DMRS-5 Red 2.5mW Class 2M
DMRS-10 Red 16mW Class 3R
DMGS-1 Green 1mW Class 2
DMGS-5 Green 5mW Class 2M
DMGS-10 Green 10mW Class 3R
DMG-5 Green 5mW Class 2M
DMG-10 Green 10mW Class 3R
DMG-20 Green 20mW Class 3B
DMSH-3L
(Line Pattern)
Red <3mW Class 2M
DMSH-3S
(Spot Pattern)
Red <3mW Class 3R
DMSH-3SP
(Cross Pattern)
Red <3mW Class 3R
DMSH-7L
(Line Pattern)
Red <3mW Class 3R
DMSH-7S
(Spot Pattern)
Red <3mW Class 3B
DMSH-7SP
(Cross Pattern)
Red <3mW Class 3B
*Laser Class prescribed by JIS C 6802:2011

Required Power Supply: AC100V~240V±10%

Coaxial Type Heling Neon Laser
Model: HN Series *Wavelength 632.8nm

Lineup

Model Power Beam
Diameter
Beam
Divergence
Polarization
HN-405R 0.5mW Φ0.8mm 1.1mrad Random
HN-405P 0.5mW Φ0.8mm 1.1mrad Linear
HN-410R 1mW Φ0.6mm 1.3mrad Random
HN-410P 1mW Φ0.6mm 1.3mrad Linear
HN-530R 3mW Φ0.7mm 1.1mrad Random
HN-530P 3mW Φ0.7mm 1.1mrad Linear
HN-550R 5mW Φ0.9mm 0.9mrad Random
HN-550P 5mW Φ0.9mm 0.9mrad Linear

Laser Head Diameter of HN Series: φ40 or 50mm
(φ44.5mm Diameter Laser Head is also available)

Extinction Ratio of Linear Type Model = 500 : 1

External Mirror Type Heling Neon Laser
Model: NEO Series

Lineup

Model Power Beam
Diameter
Beam
Divergence
Polarization
NEO-1mW
(632.8nm)
0.6mW Φ0.8mm 1.1mrad Random
NEO-15MS
(632.8nm)
15mW Φ1.3mm 0.6mrad Linear
NEO-30MS
(632.8nm)
30mW Φ1.5mm 0.5mrad Linear
NEO-15R2
(1.15μm)
5mW Φ1.5mm 1.0mrad Linear
NEO-30R2
(1.15μm)
8mW Φ1.7mm 0.9mrad Linear
NEO-15R4
(1.52μm)
1.5mW Φ1.5mm 1.0mrad Linear
NEO-30R4
(1.52μm)
3mW Φ1.6mm 1.3mrad Linear
NEO-15R3
(3.39μm) *
4mW Φ2.6mm 1.7mrad Linear
NEO-30R3
(3.39μm) *
8mW φ3mm 1.6mrad Linear
*CE Support Model is available.

Extinction Ratio of Linear Type Model = 1000 : 1

Desktop Maskless Lithography

Desktop Maskless Lithography System “PALET”
Model: DDB-701 Series

Summary

Desktop Size Maskeless (direct-exposure) Lithography System which supports simple lithography operation by its sophisticated software.

Hardware Feature

Compact Size

Built-in Vibration Isolation Mechanism & Vacuum Suction Pump

Requiring Power Supply and Yellow Room, only

Software Feature

User Friendly Interface

Simple Work Flow

Supporting Alignment & Exposure Condition Inspection *Motorized Stage Model, Only

Exposure Example

Circuit / Sensor Pattern

  • Circuit Pattern
  • Transistor Pattern
  • Magnetic Sensor Pattern

Three-dimensional Structure *×2 Objective Lens, only.

  • High Aspect Pillar
    Structure
  • Thick Film Fluid Path
    Structure
  • ES Cell Cultivating
    Structure

Specification

Model DDB-701-MS DDB-701-DL
Stage Manual
XYZθ Stage
Motorized
XYZθ Stage
Exposure
Light Source
365nm (typ.) LED
Min. Line Width 3μm *1
15μm *2
One Shot
Exposure Area
1mm×0.6mm *1
5mm×3mm *2
Exposure Time
per One Shot *3
1~2 sec. *1
15~30 sec. *2
Max. Exposure
Area
25mm×25mm
(Manual Connection)
25mm×25mm
(Automatic Connection)
Acceptable
Work Size
60mm ×60mm (t3mm)
Supporting File Format DXF, JPEG, PNG, BITMAP, XPS
Main Body Size 300mm (W) × 450mm (D) ×450mm (H)
Main Body Weight 30kg
Construction Main Body / Note
PC / Software
Main Body / Note
PC / Stage Drivers /
Software
*1 In the case of using ×10 Objective Lens
*2 In the case of using ×2 Objective Lens
*3 Exposure time based on AZP series photoresist (t0.5mm)

Magneto-optical Effect Measurement and Observation

Micro Kerr Loop Measurement System
Model: BH-PI920 Series

Summary

Diode Laser based Kerr Loop Measurement System. Microscopic local measurement in the scale of few μm is available.

Specification

Light Source Diode Laser (408nm)
*Other wavelength is available.
Measurement
Kerr Effect
Polar Kerr Effect
Longitudinal Kerr Effect
Laser Spot
Diameter
φ2μm
*with x50 Magnification, Polar Kerr Measurement
Available
Magnification
×20、×50
*Other Magnifications are also available.
Available
Magnetic Field
Out-of-plane Direction: Max. ±20kOe (±2T)
In-plane Direction: Max. ±7kOe (±0.7T)

Measurement Example

  • Kerr Hysteresis Loop
    (with x50 Objective Lens)

Kerr Loop Measurement
& Domain Observation System
Model: BH-1071 Series

Summary

Combined system for dynamic (real time) magnetic domain observation and microscopic Kerr loop measurement.

Specification

Light Source Diode Laser (408nm or 650nm)
High Brightness White LED
Target
Kerr Effect
Polar Kerr Effect
Longitudinal Kerr Effect
Spatial
Resolution
φ2μm
*with x50 Magnification, Polar Kerr Effect
Available
Magnification
×20、×50
*Other Magnifications are also available.
Available
Magnetic Field
Out-of-plane Direction: Max. >±10kOe (±1T)
In-plane Direction: Max. >±10kOe (±1T)

Data Example

  • Magnetic Domain
  • Kerr Loop

Magnetic Domain Observation Microscope
Model: BH-742 Series

Summary

Highly Sensitive Kerr Microscope for dynamic (real time) observation of magnetic domains under magnetic field in short time.

Specification

Light Source High Brightness White Light
Observing
Kerr Effect
Polar Kerr Effect
Longitudinal Kerr Effect
Domain
Resolution
< 1μm
*with x50 Magnification, Polar Kerr Observation
Available
Magnification
×20、×50
*Other Magnifications are also available.
Available
Magnetic Field
Out-of-plane Direction: Max. ±20kOe (±2T)
In-plane Direction: Max. ±20kOe (±2T)

Observation Example

  • Permanent Magnet
  • Permanent Magnet
  • Amorphous Ribbon
  • Permalloy (NiFe)
  • Electromagnetic
    Steel Sheet
  • Ferromagnetic
    Thin Film

Compact Kerr Microscope
Model: BH-753 Series

Summary

Desktop size Kerr Microscope specially designed for sensitive magnetic domain observation of soft magnetic materials.

Specification

Light Source High Brightness White LED
Target
Kerr Effect
Longitudinal Kerr Effect
Domain
Resolution
3μm
*with x50 Magnification
Available
Magnification
×20、×50
Available
Magnetic Field
In-plane Direction: Max. ±1kOe (±0.1T)

Observation Example

Perpendicular Magnetic Recording Media
Evaluation System
Model: BH-810CPC Series

Summary

Non-contact Evaluation System for Perpendicular Recording Media (PMR) of Hard Disk with Mapping Evaluation Function.

Specification

Light Source Diode Laser (408nm)
Measurement
Kerr Effect
Polar Kerr Effect
Laser Spot
Diameter
φ1mm
Magnetic Field Out-of-plane Direction: Max. ±20kOe (±2T)
Disk Size 2.5 Inch or 3.5 Inch Disk

Measurement Example

Soft Magnetic Layer Evaluation System
Model: BH-618HS-P20 Series

Summary

Non-contact Evaluation System for Soft Magnetic Layer, such as SUL in Hard Disk Media with Mapping and Skew Angle measurement functions.

Specification

Light Source Diode Laser (408nm and 780nm)
Measurement
Kerr Effect
Longitudinal Kerr Effect
Laser Spot
Diameter
φ2mm
Magnetic Field Out-of-plane Direction: Max. ±2.5kOe (±0.25T)
Disk Size 2.5 Inch or 3.5 Inch Disk

Measurement Example

HAMR Media Evaluation System
Model: BH-802HM Series

Summary

Non-contact Evaluation System for Heat (Thermal) Assisted Magnetic Recording Media (HAMR or TAMR) with generating magnetic field ±6.5T.

Specification

Light Source Diode Laser (408nm)
Measurement
Kerr Effect
Polar Kerr Effect
Laser Spot
Diameter
φ1mm
Magnetic Field Out-of-plane Direction:
Max. ±65kOe (±6.5T)
Disk Size 3.5 Inch Disk

Measurement Example

Perpendicular Magnetic AnisotropyEvaluation System
Model: BH-R810 Series

Summary

Angular Dependence Analysis System with rotating sample holder under fixed magnetic field direction.

Specification

Light Source Diode Laser (408nm)
Measurement
Kerr Effect
Polar Kerr Effect
Laser Spot
Diameter
φ1mm
Magnetic Field Max. ±20kOe (±2T)
*Applicable Magnetic Field Angle: <0°~>90°
Sample Size 10 ×10mm (t1mm)
*Cut Sample Only

Measurement Example

Polar Kerr Effect Measurement System for Wafer
Model: BH-810CPC25 Series

Summary

Non-contact Evaluation System for 8 Inch or 12 Inch Wafer targeting mapping measurement of Magnetic Semiconductor.

Specification

Light Source Diode Laser (408nm or 650nm)
Measurement
Kerr Effect
Polar Kerr Effect
Laser Spot
Diameter
<φ1mm
Magnetic Field Out-of-plane Direction: Max. >±20kOe (±2T)
Wafer Size 8 Inch or 12 Inch Wafer

Measurement Example

Longitudinal Kerr Effect Measurement System for Wafer
Model:BH-618SK Series

Summary

Non-contact Evaluation System for 8 Inch or 12 Inch Wafer targeting mapping measurement of hard disk head and magnetic sensor.

Specification

Light Source Diode Laser (408nm or 650nm)
Measurement
Kerr Effect
Longitudinal Kerr Effect
Laser Spot
Diameter
φ2mm
Magnetic Field In-Plane Direction: Max. >±2kOe (±0.2T)
Wafer Size 8 Inch or 12 Inch Wafer

Measurement Example

GHz Vibration Observation

GHz Vibration Observation System
Model: MLD-101 Series

Summary

Laser based observation system specially designed for visualization of surface acoustic wave (SAW) and Bulk Acoustic Wave (BAW) of Dielectric / Piezoelectric based high frequency devices, such as SAW filters (Interdigital Transducer (IDT)) and Film Bulk Acoustic Resonators (FBAR).

Feature

Suitable for Analysis of Physical Acoustic Wave Propagation over different frequencies

Wide Area Observation in Short Time

Image FFT & IFFT Processing

Observation Example

IDT

FBAR

Specification

Vibration Detecting Method Sagnac Interferometer based Vibration
Detection (Peak Frequency Sensitivity:
5GHz)
Vibration Observation Method Stage Control Scanning Observation with
Laser Beam Probe
(for Out-of-plane Vibration)
Observation
Light Source
Diode Laser (Wavelength: 650nm Typ.),
Lighting LED
Available
Objective Lens
×20、×50、×100 Objective Lenses
Observable
Frequency
500MHz ~ 6GHz (Typ.)
Driving Signal Input Range *1 500MHz~6GHz
(-120dBM~+15dBM) *2
Maximum Analyzable Area 25mm × 25mm
Acceptable
Work
Max. 8 Inch Wafer
Sample Stage Motorized X-Y Stage
Major Software
Functions
Preset Area Scanning Observation based
on Sample Stage Control
2 Dimensional ⇔ 3 Dimensional
Observation Result Indication (in Movie)
2 Dimensional FFT ⇔ IFFT Image
Processing
Specific Vibration Resonance Mode
Filtering based on FFT Result
Out-of-plane Axis Inclination Correction
Continuous Data Acquisition based on
Preset Frequency Table
Construction Main Body / Electrical Units / Signal
Generator / Lock-in Amplifier / Stage
Drivers / PC / Software
*1 High frequency probing sets are available. (Manual probing)
*2 Input Signal Amplifier is available.